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KMID : 0381920060360020025
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Korean Journal of Microscopy
2006 Volume.36 No. 2 p.25 ~ p.33
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A New Trend of In-situ Electron Microscopy with Ion and Electron Beam Nano-Fabrication
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Furuya Kazuo
Tanaka Miyoko
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Abstract
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Nanofabrication with finely focused ion and electron beams is reviewed, and position and size controlled fabrication of nano-metals and -semiconductors is demonstrated. A focused ion beam (FIB) interface attached to a column of 200 keV transmission electron microscope (TEM) was developed. Parallel lines and dots arrays were patterned on GaAs, Si and SiO2 substrates with a 25 keV Ga+-FIB of 200 nm beam diameter at room temperature. FIB nanofabrication to semiconductor specimens caused amorphization and Ga injection. For the electron beam induced chemical vapor deposition (EBI-CVD), we have discovered that nano-metal dots are formed depending upon the beam diameter and the exposure time when decomposable gases such as W(CO)6 were introduced at the beam irradiated areas. The diameter of the dots was reduced to less than 2.0 nm with the UHV-FE-TEM, while those were limited to about 15 nm in diameter with the FE-SEM. Self-standing 3D nanostructures were also successfully fabricated.
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KEYWORD
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Beam induced CVD, Decomposition, Electron beam, Drilling, Focused ion beam, Nanodots, Nanoparticles
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